Carbon-Nitride (CN_x) film is a material that may successfully compete with DLC coatings, which have high hardness, high wear resistance, and a low friction coefficient. CN_x films were prepared on silicon substrate by a Close Field UnBalanced Magnetron sputtering with a graphite target and using the N₂-Ar mixture gas. It is obtained parameters on the deposition rate and investigated effect of negative DC bias voltage and N₂ Pressure. The Characteristic of the carbon-nitride films were investigated of the microstructure, chemical composition, surface morphology, surface free energy, and by physical properties by measurements of Raman spectroscopy, FT-IR(Fourier transform infrared), EDX(Energy Dispersive X-ray analysis), AFM(Atomic Force Microscopy), contact angle, nano-indentation and friction coefficient.

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