Pulsed Laser Deposition (PLD) technique is a quite common laboratory technique, known to have many advantages for the thin films depositions. Several ways for the improvement of the film surface quality have been investigated in literature. However, it still has a several drawbacks (e.g. droplet formation) which makes it unusable for some industrial applications. Work presented in this paper is aimed to provide a more comprehensive understanding of PLD techniques and ways to improve the control of the deposited thin film parameters.
A novel three-dimensional model has been proposed for simulating plume behavior and ‘micron-sized particles’ movement and interaction. It describes the plume expansion in vacuum or into an environmental gas and particles interaction with various obstacles. The model simulates ‘standard’ PLD system behavior but also some droplet reduction techniques used in PLD (e.g. shadow mask technique, back-side deposition …) The model combined the advantages of Monte-Carlo and Finite Element methods, being able to give a detailed image of particles behavior, both from microscopic and macroscopic points of view. Some significant results and theoretical interpretations together with proposal for experimental system adjustment are also presented.

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