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Characterization of TiO2 thin films deposed on Ti and SnO2 (F) by a dip-coating MF.BENCHARIF, A.CHARI, T.KERBACH, E.TAYAR [email protected] [email protected]

Abdelhamid Chari 

Laboratoire de Physique-chimie des semiconducteurs (LPCS), Université Mentouri Constantine, Constantine 25000, Algeria


TiO2 thin films have been obtained by a dip-coating method on Ti and SnO2 (F). Structural and physicals properties of the films have been examined for different number of dips and annealing at a temperature of 723 K.

Scanning Electron Microscopy (SEM) and X rays diffraction (XRD have been used to characterize the films morphology and composition. These films are anatase phase and nano-metric with a grain size of 18 to40 nm.

The photo catalytic activity of the nano-structured TiO2 thin films were evaluated by the degradation of solo phenyl red 3BL and compared with that obtained using P25 TiO2.


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Presentation: Poster at E-MRS Fall Meeting 2009, Symposium H, by Abdelhamid Chari
See On-line Journal of E-MRS Fall Meeting 2009

Submitted: 2009-04-19 13:46
Revised:   2009-06-07 00:48