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Giant Magnetoresistance Dependence of Film Thickness, Annealing Temperature, Multilayer and Gas Rate in Layered Co/Cu/Co Nanotructures |
Samsudi Sakrani , Y.C Lau , Yussof B. Wahab , Rashdi Shah.B Ahmad |
Universiti Teknologi Malaysia, Institute of Ibnu Sina, Johor 81310, Malaysia |
Abstract |
Experimental parameters effecting the giant magnetoresistance (GMR) of Co/Cu/Co nanostructures are investigated. The samples were fabricated using a sputtering method with varying Co layer thicknesses in vacuum, and were annealed at temperatures 200-450C for 150 minutes. GMR measurements were carried out in magnetic fields of 2500 Gauss. Apparently, a rapid 10% rise in GMR with Co layer thickness was observed between 2 - 6 nm, followed by a gradual drop along the thickness up to 20 nm. Annealing temperature has similar effect when its ascending mode attains a 24% GMR peak point at 400C beyond which the GMR starts to fall steadily to 20% at 450C. It is predicted that, the Co and Cu species become soluble to each other as they reach 400C and a solubility process is initiated between them with Co atoms gradually precipitated from the Cu matrix, thus forming the Co clusters. Due to ferromagnetic interaction occurring at temperature exceeding 400C an anti-parallel structure is established in the sample .
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Presentation: oral at E-MRS Fall Meeting 2004, Symposium I, by Samsudi SakraniSee On-line Journal of E-MRS Fall Meeting 2004 Submitted: 2004-04-13 09:21 Revised: 2009-06-08 12:55 |