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Nanostructured oxide thin films prepared by plasma and related Methods
|Agustin R. González-Elipe , Angel Barranco , Ana Borras , Juan Pedro Espinos|
Instituto de Ciencia de Materiales de Sevilla (ICMSE), Avda. Americo Vespucio, 49, Sevilla 41092, Spain
Oxide thin films prepared by plasma and other related “dry” methods are typically used for a large variety of functional applications because of their optical, electrical and/or magnetic properties. Modifications of these classical methodologies may lead to an efficient control of the nanostructure, porosity and composition of the synthesized films, thus opening new areas of applications as membranes, photo-catalysts, sensors , etc. This presentation discusses recent developments in nanostructuring processes of oxide thin films prepared by plasma or evaporation at glancing angles and about the characterization of porosity these thin films.
Different examples of SiO2 and TiO2 thin films illustrate the possibilities of these methods for an efficient control of the nanostructure and the use of these materials as diffusion membranes, optical sensors and/or photo-catalytic plates. The synthesis at low temperatures of nanofiber oxide films by plasma techniques is another recent development that permits the preparation of advanced materials with controlled hydrophilicity and photovoltaic device applications.
A critical issue with these nanostructured thin films is the assessment of their porosity. Total pore volume and type of pores can be determined with a quartz crystal monitor to measure the adsorption isotherms of water in the pores. Preliminary results about the surface functionalization of the internal pores of the films and their use for the tailored synthesis of new nanostructured composite materials are also presented.
Presentation: Invited oral at E-MRS Fall Meeting 2008, Symposium D, by Agustin R. González-Elipe
See On-line Journal of E-MRS Fall Meeting 2008
Submitted: 2008-05-12 10:44 Revised: 2009-06-07 00:48