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The effect of thermal treatment conditions employed in sol-gel method on the structure of ZnO thin films

Takashi Ehara ,  Takafumi Otsuki ,  Junya Abe ,  Takaaki Ueno ,  Masahiro Ito ,  Takafumi Hirayama 

Ishinomaki Senshu University, Ishinomaki 986-8580, Japan

Abstract

We have prepared the ZnO thin films by the sol-gel method from a 2-methoxyethanol solution of zinc acetate dihydrate stabilized by 2-aminoethanol on SiO2 substrates. The structure of the films showed a significant dependency on thermal treatment temperature, not only in the final thermal-annealing process at several hundreds of degrees, but also in the heat-treatment after spin coating at lower temperature to evaporate the solvent in the films. The intensity of the (0002) peak in X-ray diffraction showed significant dependence on the heat treatment conditions after spin coating which ranged from 100ºC to 300ºC. The temperature employed in the initial 10 min of the heat treatment was found to be important in determining the structure of the film. The results indicate that the elimination condition of the organic components is important in achieving the high crystallinity.

 

Auxiliary resources (full texts, presentations, posters, etc.)
  1. POSTER: The effect of thermal treatment conditions employed in sol-gel method on the structure of ZnO thin films, Microsoft Office Document, 2.4MB
  2. FULLTEXT: The effect of thermal treatment conditions employed in sol-gel method on the structure of ZnO thin films, Microsoft Office Document, 0.1MB
 

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Related papers

Presentation: Poster at E-MRS Fall Meeting 2008, Symposium B, by Takashi Ehara
See On-line Journal of E-MRS Fall Meeting 2008

Submitted: 2008-05-12 07:29
Revised:   2009-06-07 00:48