It is well known, Polymeric films with controlled nanoscale features (thickness, porosity, roughness, surface structures or inclusions such as nanoparticles) can provide systems with radically new chemical or physical properties. Among them, barrier, mechanical protection, super-hydrophobicity, antireflectivity, conductivity, antimicrobial, antifouling are identified as being the most relevant.  Moreover, the miniaturization of functional micro devices will be reached by the manipulation on the nanoscale of polymer thin films.

Plasma tools are now highly involved in the development of new technologies and processes with full control over the nanoscale for the mass production of new highly innovative products integrating such size dependant properties enabling innovation.

Three main fields have been investigated and succinctly described below: nanolayering, nanoclustering and nanotexturing.

Nanolayering is presented as a multi nano-layering deposition of successive polymeric layer for combining different physical and chemical properties can be achieved by PECVD (high density plasma, pulsed plasma or capacitive plasma): nanolayering of different organic thin films (SiOxCyHz, CFx, CHx) .

Nanoclustering can be a PECVD/sputtering co-deposition : sputtering of a material (Pt, Ag, …) to provide nanoclusters imbedded in polymeric matrix deposited from monomer such as SiOxCyNz, CFx, CHx, ….

Nano-texturing is a surface patterning process which allows to design a topography tailored to the specific application : i.e. super-hydrophobicity …

This presentation will give a large overview of plasma processes which can be achieved to reach scientific (phenomenon understanding, control of final properties, plasma and surface diagnostics …) and industrial (high speed processes, on line control, repeatability,…)  targets. In that way plasma reactors, diagnostics tools and results will be described, explained and linked to final properties to be reached.

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