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Application of position sensitive detectors for in-situ XRD investigations of electrochemical processes |
Paul Angerer , Rudolf Mann , Aleksandra Gavrilovic , Werner Artner , Gerhard E. Nauer |
ECHEM Kompetenzzentrum für angewandte Elektrochemie (ECHEM), Viktor-Kaplan-Strasse 2, Wiener Neustadt A-2700, Austria |
Abstract |
In a conventional XRD goniometer device the diffraction intensity is determined consecutively over the diffraction angle range. The development of efficient and highly sensitive image-plate detectors enables the fast and instantaneous recording of the diffraction pattern up to 140° 2θ. In addition a linear position sensitive detector (linear-PSD) with a restricted range of diffraction angle of several degrees enabling high angular resolution was used. These two types of detection instruments were applied for the in-situ study of comparatively rapid electrochemical processes on electrode surfaces at different angle of incidence. The advantages and disadvantages of these detection systems and the related measurement procedures will be discussed in detail. The use of an appropriate in-situ electrochemical cell is essential. The electric potential and current were recorded during the measurement series. The detection of the phase formation especially in the uppermost electrode surface region up to a depth of a few micrometers was achieved by variation of the penetration depth by different angles of incidence. The phase composition in the irradiated region was determined quantitatively during the electrochemical reaction by means of the Rietveld refinement method. However, the observed values are strongly influenced by the layered structure of the sample and by the different absorption coefficients of the phases. Furthermore, the absorption of the diffraction pattern of the electrode material gives information on the absorption properties of the reaction layers. Up to now our studies are focussed on different composed lead electrodes in sulphate containing electrolytes with various additives and the electrodeposition of metals on different substrates.
Figure 1: In-situ XRD traces of galvanostatically deposited copper on a nickel substrate with increasing deposition time. Acknowledgements: This work was supported within the K plus programme by the Austrian Research Promotion Agency and the government of Lower Austria. |
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Presentation: Poster at 11th European Powder Diffraction Conference, Poster session, by Paul AngererSee On-line Journal of 11th European Powder Diffraction Conference Submitted: 2008-03-28 18:44 Revised: 2009-06-07 00:48 |