The effect of Cl (minus) ions (0-1M NaCl) on the anodic behaviour of two series of sputter-deposited Al-Ta (11-46 at %) and Al-Nb (13-46 at %) amorphous alloys was investigated in neutral electrolytes by using electrochemical and in-situ microscopic methods.
The samples were characterized by AES; a thin alumina film was found to cover the surface of the substrate, whereas transition metal was not detected therein. In solutions containing Cl (minus) the alloys broke down at and above the pit nucleation potential Enp. The alloys exhibited a stable passivity within a much wider (Δ E> 1V) potential range than crystalline Al. In-situ microscopic investigations revealed that for Al-Ta and Al-Nb amorphous alloys the local current density within the pits was ~10⁶ higher than the c.d. from the remaining passive surface. The results are compared with those for Al-Mo and Al-W alloys and the mechanism of restrained passivity breakdown is discussed.

This work was supported by the State Committee for Scientific Research under grant
7T08C0 1220

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