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Towards In-Situ Pulsed Laser Deposition
|Vedran Vonk 1, Sybolt Harkema 2, Guus Rijnders 2, Heinz Graafsma 1|
1. Europen Synchrotron Radiation Facility (ESRF), 6, Jules Horowitz, Grenoble 38000, France
Pulsed Laser Deposition (PLD) has become a widely used method to grow single crystal thin films of high quality. Since PLD can take place under controlled oxygen atmosphere, it is especially suited for the growth of thin-film high-Tc superconductors (HTSC,s), whose properties are highly sensitive to their oxygen content. Although the PLD process is commonly used, the growth and nucleation mechanisms are still not completely understood. In order to gain more insight into these processes, a miniature PLD chamber is being constructed for the purpose of following with x-ray diffraction (XRD) the initial stages of growth of YBa2Cu3O7-δ (YBCO) on SrTiO3 (STO) substrates, and the subsequent annealing of the film.
Presentation: poster at E-MRS Fall Meeting 2003, Symposium B, by Vedran Vonk
See On-line Journal of E-MRS Fall Meeting 2003
Submitted: 2003-07-17 16:51 Revised: 2009-06-08 12:55