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Domain competition in deposition growth

Kenyu Osada 1Hiroyasu Katsuno 1Toshiharu Irisawa 1Shintaro Suzuki 2Yukio Saito 2

1. Gakushuin University Computer Center, 1-5-1 Mejiro Toshima-ku, Tokyo 171-8588, Japan
2. Keio University, Faculty of Science and Technology (Keio), 3-14-1 Hiyoshi, Kouhokuku, Yokohama 2238522, Japan

Abstract

In heteroepitaxial growth, deposited adatoms start solidification by contacting with a substrate. Due to misfit or misorientations between the adsorbate and substrate,  crystals started to grow from different contact points may be incoherent each other. We consider an extreme case that each contact point initiates separate crystal domain, and study their competition during deposition growth by kinetic Monte Carlo simulations of a lattice-gas system.
In a ballistic deposition (BD) model, a deposited adatom freezes at a position of a first contact with substrate or already crystallized adatoms. The number density of domains ρ decreases as the height h of the BD aggregate increases in a power law as ρ ∝ h. The value of the exponent is γ ≅ 0.67 in a two-dimensional BD model, and γ ≅ 1.1 in a three-dimensional BD. The results agree with theoretical estimation that the exponent γ is inversely proportional to the dynamical exponent z of the d-dimensional BD growth front as γ = (d-1)/z. We study further the effect of surface diffusion on the exponent γ.

 

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Related papers

Presentation: Poster at 17th International Conference on Crystal Growth and Epitaxy - ICCGE-17, General Session 1, by Kenyu Osada
See On-line Journal of 17th International Conference on Crystal Growth and Epitaxy - ICCGE-17

Submitted: 2013-04-03 12:26
Revised:   2013-04-12 11:14