Titanium dioxide is the most widely studied and used photocatalyst. TiO₂ based photocatalysts are used for air and water purification, and as self-cleaning and sterilizing coatings. A lot of methods exist for preparation of TiO₂ photocatalysts in the form of both powders and coatings. Among these methods atomic layer deposition (ALD) can distinguish itself mostly based on its excellent conformality and possibility to tailor the composition at atomic layer level. This paper summarises our work on ALD of TiO₂ based photocatalysts. Areas to be covered include comparison of various TiO₂ ALD processes available, doping and modification of ALD-TiO₂ in an effort to make it active also under visible wavelengths, preparation of three-dimensional photocatalyst structures exploiting the unique features of ALD, and enhancement of the photocatalytic process by an external bias voltage (photoelectrocatalysis).

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