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dr Takao Abe
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phone:
+81-27-3852575
fax:
+81-27-3852774
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interest(s):
Affiliation:
Shin-Etsu
address:
, Annaka, 379-0196,
Japan
phone:
fax:
web:
Participant:
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
began:
2013-08-11
ended:
2013-08-16
Presented:
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
Discrepancies between experimental results and simulations on point defects behavior during silicon crystal growth from the melt
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
Creations of interstitial inside crystal during silicon melt growth by heating melt
17th International Conference on Crystal Growth and Epitaxy - ICCGE-17
Creations of vacancy on growth interface during silicon melt growth by decreasing pulling rate
Publications:
Creations of interstitial inside crystal during silicon melt growth by heating melt
Creations of vacancy on growth interface during silicon melt growth by decreasing pulling rate
Discrepancies between experimental results and simulations on point defects behavior during silicon crystal growth from the melt
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