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dr Masashi Ishii
e-mail: | ***@nims.go.jp |
phone: | +81-29-8604576 |
fax: | +81-29-8592801 |
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interest(s): | |
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Affiliation: |
National Institute for Materials Science |
Participant: |
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Publications: |
- Y2O3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma
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