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- Dominika N. Teklińska
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| e-mail: | ***@gmail.com |
| phone: | +48-22-8353041 |
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| web: | |
| interest(s): | |
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Affiliation: |
Instytut Technologii Materiałów Elektronicznych
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| address: | Wólczyńska, Warszawa, 01-919, Poland | | phone: | | | fax: | | | web: | | |
Affiliation: |
Politechnika Warszawska |
Participant: |
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Publications: |
- Improvement of the quality of polished SiC wafers using chemical oxidation and heat treatment
- The influence of pressure on growth of 3C-SiC heteroepitaxial layers on silicon substrates
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