Rietveld refinement for polycrystalline indium nitride
LATTICE PARAMETERS OF INDIUM NITRIDE IN THE 22-310 K TEMPERATURE RANGE
Promising high quality short period Fe/Fe-N multilayers deposited by the sputtering
Relationship between condition of deposition and properties of W-Ti-N thin films prepared by reactive magnetron sputtering
Structural and Magnetic Properties of Cr/Gd Multilayers Deposited on Sapphire and MgO Substrates