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- Toshiharu Ohnuma
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Affiliation:
Central Research Institute of Electric Power Industry
address:
, Tokyo, 201-8511,
Japan
phone:
fax:
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Participant:
E-MRS Fall Meeting 2008
began:
2008-09-15
ended:
2008-09-19
Presented:
E-MRS Fall Meeting 2008
Dynamical simulation of SiO
2
/4H-SiC C-face interface oxidation process at 1500K
Publications:
Dynamical simulation of SiO
2
/4H-SiC C-face interface oxidation process at 1500K
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