Search for content and authors
 

Byoung-Hun Lee

e-mail:
phone:
fax:
web:
interest(s):

Affiliation:


IBM

address: , , , United States
phone:
fax:
web:

Affiliation:


IBM Assignee to SEMATECH

address: , , , United States
phone:
fax:
web:

Publications:


  1. Spectroscopic analysis of thin HfO2 and HfSiOx gate dielectric thin films exposed to NH3 anneal processing




Google
 
Web science24.com
© 1998-2024 pielaszek research, all rights reserved Powered by the Conference Engine