Relationship between condition of deposition and properties of W-Ti-N thin films prepared by reactive magnetron sputtering
|Andrian V. Kuchuk 3, Vasyl P. Kladko 3, Oksana S. Lytvyn 3, Anna Piotrowska 1, Roman Minikayev 2, R Ratajczak 4|
1. Institute of Electron Technology (ITE), al. Lotników 32/46, Warszawa 02-668, Poland
In this work we studied the relationship between condition of deposition (especially, nitrogen partial pressure) and material properties (chemical and phase compositions, microstructure, mechanical stress, surface morphology, resistivity, diffusion barrier performance), of W-Ti-N thin films.
Presentation: poster at E-MRS Fall Meeting 2005, Symposium H, by Andrian V. Kuchuk
See On-line Journal of E-MRS Fall Meeting 2005
Submitted: 2005-05-30 14:47 Revised: 2009-06-07 00:44
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