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Three-dimensional numerical simulation of flow, thermal and oxygen distributions for a Czochralski silicon growth with in a transverse magnetic field

Jyh-Chen Chen 1Ying-Yang Teng 2Pei-Yi Chiang 1Chun-Hung Chen 1Ching-Hsin Chang 1Chien-Cheng Liu 3

1. National Central Univercity, Department of Mechanical Engineering, Taoyuan 32001, Taiwan
2. Chung Shan Institute of Science and Technology, Taoyuan 32546, Taiwan
3. Sino-American Silicon Products Inc., Hsinchu 30075, Taiwan

Abstract

A three-dimensional numerical simulation has been performed to understand the motion of the melt flow during the Czochralski silicon single crystal growth process under the influence of a transverse magnetic field.  With the application of a transverse magnetic, the velocity, temperature and oxygen distributions in the melt become three-dimensional and asymmetric.  A stronger spiral vortex motion is formed under the crystal-melt interface.  The temperature is higher at the crucible wall due to the stronger downward flow motion near the crucible center and the weaker flow motion near the sidewall.  This increases the dissolution rate of oxygen from the quartz crucible.  However, the stronger spiral motion can prevent the transfer of oxygen impurities towards the crystal-melt interface.  This may explain why the presence of a transverse magnetic field decreases the incorporation of oxygen.  The effect of crucible rotation on the oxygen concentration and distribution is investigated.  In the transverse magnetic field, the results show that the oxygen concentration decrease with the crucible rotation rate decreased.  For larger size of the silicon crystal, the results also display this tendency.

 

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Related papers

Presentation: Poster at 17th International Conference on Crystal Growth and Epitaxy - ICCGE-17, Topical Session 8, by Jyh-Chen Chen
See On-line Journal of 17th International Conference on Crystal Growth and Epitaxy - ICCGE-17

Submitted: 2013-03-20 13:57
Revised:   2013-03-20 14:05