We report the deposition and growth of m-plane non-polar (10.0) ZnO oriented thin films on MgO (100) substrates using the rf-magnetron sputtering technique. The key parameters temperature, oxygen partial pressure and substrate/film lattice mismatch must be combined to yield a preferred growth orientation. HRXRD and AFM microscopy reveals macroscopic single domain structures with 13º rotations relative to the substrate due to in-plane MgO [011] alignment with the ZnO [01.1]. PL emission and Raman spectroscopy were the techniques used for thin film optical characterization.

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