Multicrystalline silicon wafers were textured in an alkaline bath, basically using NaOH and in acidic bath, using mainly HF, HNO₃ , De-ionized water, Na₂ PO₄ and H₃PO₄ in different composition ratio and treatment time. Comparison of average reflectance of the treated samples for the range of 400 nm to 1100 nm wavelength of light showed low reflectance value (< 5 %) for the acid textured sample in the optimized condition. The solar cells were thus fabricated with the samples following the main steps such as Phosphorus doping for emitter layer formation, PECVD Silicon Nitride deposition for anti-reflection coating and front surface passivation , Screen Printing metallization, RTP co-firing and Laser edge isolation and confirmed 14 % conversion efficiency from the best textured samples. This isotropic acid texturing approach can be instrumental to replace conventional alkaline texturing approach for the mass production of low cost and efficient solar cell with the multicrystalline silicon as the starting material.

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