Antireflective properties of silica films formed in sol-gel processes

Janusz Jaglarz 1Paweł Karasiński 2

1. Cracow University of Technology, Institute of Physics (PK), Podchorążych 1, Kraków 30-084, Poland
2. Silesian University of Technology, Institute of Physics, Department of Microelectronics, Krzywoustego 2, Gliwice 44-100, Poland

Abstract

Sol-gel technology offers huge potential capabilities involving the fabrication of low refractive index layers  which the refractive index can change within the range n=1.1 – 2.3, depending on the composition and the applied technological process. Therefore, basing on the silica films we can fabricate multilayer structures with a preset refractive index which can offer high application possibilities. In planar optoelectronics the silica films, depending on their optical and geometrical parameters, can be used as waveguide films, masking layers, and when supplied with an indicator they can be used as sensitive layers. The inhomogeneouity of these films may be also used as ARC (antireflective coatings).

The work presents silica films of the refractive index 1.12 to1.21  silica films of high  Basic fabrication technology was presented as well as the applied measurement methods of refractive index and thickness. The paper provides examples for the application of the elaborated technology for the fabrication of waveguide films.

Basic fabrication technology was presented as well as the applied measurement methods of refractive index and thickness. The paper provides examples for the application of the elaborated technology for the fabrication of sensitive layers
 

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Presentation: Poster at E-MRS Fall Meeting 2008, Symposium B, by Janusz Jaglarz
See On-line Journal of E-MRS Fall Meeting 2008

Submitted: 2008-07-19 16:52
Revised:   2009-06-07 00:48